Chemical etching is to selectively remove the part of the film layer that is not masked by the resist by chemical, physical or chemical and physical methods at the same time, so as to obtain completely consistent patterns on the film and the resist film. Chemical etching technology is mainly divided into dry etching and wet etching. Dry etching mainly uses reactive gas and plasma for etching; Wet etching mainly uses chemical reaction between chemical reagents and the chemical etching material to etch.
The chemical etching process removes the film layer not covered by the resist, so as to obtain the same pattern on the film as that on the resist film. In the manufacturing process of integrated circuit, after mask registration, exposure and development, the required figure is copied on the resist film, or the figure is directly drawn on the resist film with an electron beam to generate a figure, and then the figure is accurately transferred to the dielectric film (such as silicon oxide, silicon nitride, polycrystalline silicon) or metal film (such as aluminum and its alloys) under the resist to produce the required thin layer pattern.
chemical etching principle
The commonly referred chemical etching is also called photochemical etching, which refers to the removal of the protective film of the area to be etched after exposure, plate making and development, and the contact with the chemical solution during chemical etching to achieve the effect of dissolution and corrosion, forming concave convex or hollow molding.
Chemical processing of glass surface
chemical etching can be used for glass as well as metal; Use hydrofluoric acid to corrode the local surface of glass products, and paint various patterns, patterns, scales, lattices, etc. on the surface. The chemical etching process is to apply protective paint or paraffin on the glass surface to be etched. Then put in an chemical etching solution consisting of hydrofluoric acid and a small amount of NH4F, the glass surface layer reacts with hydrofluoric acid, and the fluoride generated is dissolved in the chemical etching solution or deposited on the glass surface.
Dongguan Asset Metal focuses on the application field of precision metal chemical etching, and is based on high-end technology research and development and process innovation. Professional chemical etching manufactures various precision metal components according to customer drawings and engineers' rich chemical etching process integration technology. In design, customers can improve and change the design more easily than stamping, saving high mold fees and lower costs. Asset Metal Chemical Etching is a high-tech enterprise that has passed ISO9001 and IFA16949D.
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